Comparison of the picosecond characteristics of silicon and silicon‐on‐sapphire metal‐semiconductor‐metal photodiodes

The picosecond characteristics of silicon‐based metal‐semiconductor‐metal (MSM) diodes with submicrometer finger spacing and width were studied. Diodes made on both bulk silicon and silicon‐on‐sapphire (SOS) substrates were measured by a subpicosecond electro‐optic sampling system. The response of bulk‐silicon MSM diodes was strongly dependent on the wavelength of the excitation light because of the change in penetration depth. The response of SOS diodes, on the other hand, had a weak dependence on wavelength since the thickness of the silicon layer limits the depth of photogenerated carriers. The response of a 200 nm SOS diode has a full‐width at half‐maximum of 4.5 and 5.7 ps with blue‐ and red‐light excitations. The external quantum efficiency of SOS diodes was also determined at several selected wavelengths.