Investigation of a-SiOx:H films as passivation layer in heterojunction interface
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Jenq-Yang Chang | Chien-Chieh Lee | I. Chen | Tomi T. T. Li | Y. Hsieh | Shian-ming Liu | Y. Chu | C. Yeh
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Jenq-Yang Chang | Chien-Chieh Lee | I. Chen | Tomi T. T. Li | Y. Hsieh | Shian-ming Liu | Y. Chu | C. Yeh