Mass spectroscopic identification of wavelength dependent UV laser photoablation fragments from polymethylmethacrylate
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[1] Bodil Braren,et al. Photochemical cleavage of a polymeric solid: details of the ultraviolet laser ablation of poly(methyl methacrylate) at 193 nm and 248 nm , 1986 .
[2] R. Srinivasan,et al. Theory of etching of polymers by far-ultraviolet high-intensity pulsed laser- and long-term irradiation , 1984 .
[3] D. Linde,et al. Velocity distribution of molecular fragments from polymethylmethacrylate irradiated with UV laser pulses , 1986 .
[4] R. Srinivasan,et al. Surface properties of poly(ethylene terephthalate) films modified by far-ultraviolet radiation at 193nm (laser) and 185nm (low intensity) , 1986 .
[5] B. Lin. Deep uv lithography , 1975 .
[6] G. Koren,et al. Emission spectra, surface quality, and mechanism of excimer laser etching of polyimide films , 1984 .
[7] C. Fotakis,et al. Spectroscopic studies of ArF laser photoablation of PMMA , 1985 .
[8] N. Turro. Modern Molecular Photochemistry , 1978 .
[9] Suzanne Stokes,et al. Photolytic degradation of poly(methyl methacrylate) , 1963 .
[10] Sylvain Lazare,et al. Modification of polymer surfaces by far-ultraviolet radiation of low and high (laser) intensities , 1985 .
[11] R. Srinivasan,et al. Microscopic model for the ablative photodecomposition of polymers by far‐ultraviolet radiation (193 nm) , 1984 .
[12] R. Srinivasan,et al. Laser ablation of organic polymers: Microscopic models for photochemical and thermal processes , 1985 .
[13] N. Bloembergen,et al. THE STIMULATED RAMAN EFFECT. , 1967 .
[14] Bodil Braren,et al. Mechanism of the ultraviolet laser ablation of polymethyl methacrylate at 193 and 248 nm: laser-induced fluorescence analysis, chemical analysis, and doping studies , 1986 .
[15] P. H. Key,et al. Direct etching of polymeric materials using a XeCl laser , 1983 .