论文信息 - Realization of high-quality HfO{sub 2} on In{sub 0.53}Ga{sub 0.47}As by in-situ atomic-layer-deposition - 字舞流文

Realization of high-quality HfO{sub 2} on In{sub 0.53}Ga{sub 0.47}As by in-situ atomic-layer-deposition

J. Kwo | Y. H. Chang | M. Hong | W. C. Lee | T. Lin | M. Huang | C. A. Lin | M. Huang | W. Lee