This paper describes the beamline optics for deep-etch x-ray lithography. In order to obtain a higher reflectivity than that provided by a mirror with a monolayer coating at photon energies of 4 to 6 keV, multilayer mirrors with a constant and graded d-spacing were developed. At an energy of 6 keV, a measured reflectivity of more than 80 percent and a bandwidth of 1 keV were obtained for a mirror with a Ni/C multilayer coating and a constant d-spacing. Moreover, it was found that, for energies form 4 to 6 keV, a multilayer mirror with a graded d-spacing provided a higher reflectivity and a wider bandwidth than a mirror with a Pt monolayer coating. A multilayer reflection mirror is a promising component of beamline optics for use in microfabrication and the structural analysis of materials.