Developing loading effect on lithography I-line process
暂无分享,去创建一个
Thomas S. Huang | Chun-Yen Huang | Chiang-Lin Shih | Walter Wang | Wen-Bin Wu | Nick Tseng | Ting-Jhen Guo
[1] Hong-Seok Kim,et al. Investigations on microloading effect: a parallel approach to PGSD (proximity gap suction development) , 2004, Photomask Japan.
[2] Daniel Courboin,et al. High flow rate development: process optimization using megasonic immersion development (MID) , 2004, SPIE Photomask Technology.
[3] Kazuo Sakamoto,et al. Novel development method to improve critical dimensional control , 2003, SPIE Advanced Lithography.
[4] Rusty Cantrell,et al. Application of a wafer development process to mask making , 2005, Photomask Japan.