Laser beam writing of computer-generated diffractive optical components

A new pattern generator, initially designed for ASIC fabrication, is employed for writing synthetic holograms and other micro-optical components. The specifications and some limits of this machine have been investigated. Test structures and synthetic holograms are shown. Arbitrary patterns with micron resolution, submicron positioning accuracy, large area (up to 150 X 150 mm2 possible), and good quality of the microprofile were demonstrated.