Evolution of Structure with Spacer Layer Thickness in Electrodeposited Co ∕ Cu Multilayers

An X-ray diffraction study of electrodeposited Co/Cu multilayers with Cu layer thicknesses (d Cu ) from 0.5 to 4.5 nm revealed that, from structural point of view, three thickness ranges can be distinguished. For d Cu 2 nm, no hcp reflections can be detected whereas clear satellite reflections appear for 2 nm 4 nm, these satellite peaks can hardly be seen again. These findings can be explained by the presence of pinholes in the Cu layers for d Cu 4 nm. The intermediate Cu thickness range is also characterized by the strongest fcc(111) texture and by the largest structural perfectness. These structural data will be very helpful in explaining magnetoresistance results on the same multilayers.

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