Scaling directions for 2D and 3D NAND cells
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This paper describes NAND cell scaling directions for 20nm and beyond. Many of the 2D NAND cell scaling challenges can be resolved by a planar floating gate (FG) cell. Scaling directions and key technology requirements for 3D NAND are also discussed.
[1] Haitao Liu,et al. A Program Disturb Model and Channel Leakage Current Study for Sub-20 nm nand Flash Cells , 2011, IEEE Transactions on Electron Devices.