Genetic method to optimize binary dithering technique for high-quality fringe generation.

The recently proposed dithering techniques could substantially improve measurement quality when fringes are wide, but offer limited improvement when fringes are narrow. This Letter presents a genetic algorithm to optimize the dithering technique for sinusoidal structured pattern representation. We believe both simulation and experimental results show that this proposed algorithm can substantially improve fringe quality for both narrow and wide fringe patterns.

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