论文信息 - Film formation of dititanium nitride by the dynamic mixing method

Film formation of dititanium nitride by the dynamic mixing method

Abstract Coating film formation of titanium nitride is studied by means of the dynamic mixing method, where the deposition rate of titanium and the current density of nitrogen ions are widely changed and, for the first time, films of the pure Ti 2 N phase are prepared in a narrow range of the ratio of the deposition rate of the titanium and the current density of the nitrogen ions, Ti/N. Under the condition that the ratio Ti/N is larger than for Ti 2 N formation, a film consists of three phases: α-Ti, Ti 2 N and TiN. For lower Ti/N, the prepared films are a mixture of two phases: Ti 2 N and TiN. In the case of a much lower Ti/N only TiN films are prepared.

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