Analysis of lateral DMOS power devices under ESD stress conditions

The physical mechanisms specific for 40 V LDMOS power transistors under ESD stress (gate grounded/coupled) are investigated in detail by transmission line pulse (TLP) measurements, human body model (HBM) testing, emission microscopy (EMMI) experiments, and two-dimensional (2-D) device simulations. Inhomogeneous triggering caused by device topology as well as the sustained nonhomogeneous current flow due to the unusual electrical behavior are accurately analyzed in single- and multi-finger devices.

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