Thin Photo-Patterned Micropolarizer Array for CMOS Image Sensors

We fabricated and characterized a thin photo-patterned micropolarizer array for complementary metal-oxide-semiconductor (CMOS) image sensors. The proposed micropolarizer fabrication technology completely removes the need for complex selective etching. Instead, it uses the well-controlled process of ultraviolet photolithography to define micropolarizer orientation patterns on a spin-coated azo-dye-1 film. The patterned polymer film micropolarizer (10 mum x 10 mum) exhibits submicron thickness (0.3 mum) and has an extinction ratio of ~ 100. Reported experimental results validate the concept of a thin, high spatial resolution, low-cost photo-patterned micropolarizer array for CMOS image sensors.

[1]  Zaven Kalayjian,et al.  A Polarization Contrast Retina Using Patterned Iodine-doped PVA Film , 1996, ESSCIRC '96: Proceedings of the 22nd European Solid-State Circuits Conference.

[2]  Albert H. Titus,et al.  An analog VLSI chip emulating polarization vision of octopus retina , 2006, IEEE Transactions on Neural Networks.

[3]  Jan Van der Spiegel,et al.  Image sensor with focal plane polarization sensitivity , 2008, 2008 IEEE International Symposium on Circuits and Systems.

[4]  Hoi Sing Kwok,et al.  Photo‐aligning by azo‐dyes: Physics and applications , 2005 .

[5]  D. Brady,et al.  Fabrication of thin-film micropolarizer arrays for visible imaging polarimetry. , 2000, Applied optics.

[6]  A. El Gamal,et al.  CMOS image sensors , 2005, IEEE Circuits and Devices Magazine.

[7]  Andreas G. Andreou,et al.  A Polarization Contrast Retina That Uses Patterned Iodine-Doped PVA Film , 1996 .