Beam profile control of line focus for x-ray laser experiment

A high aspect ratio line focus on a target for the x-ray laser experiments is required for obtaining a high gain-length product. A new line focus system is developed to generate a uniform line focus. The system consists of a deformable mirror of a continuous faceplate type which provides an appropriate wavefront distribution for compensating an aberration of a line focus optic. The width and intensity distribution of 18.2 mm long line focus has been improved on 2 times diffraction limit. In another application, a rectangular beam shaping from a circular defocused beam is investigated by the experiment and the diffraction calculation. The controllability of intensity distribution of laser beam by deformable mirror has been demonstrated.