Micromachined piezoresistive tactile sensor array fabricated by bulk-etched MUMPs process

This paper discusses the design, fabrication and testing of a 5/spl times/5 micromachined tactile sensor array for the detection of an extremely small force (micrometer-Newton range). Central contacting pads that are trampoline-shape suspended structures and sensor beams are formed using anisotropic etching of the silicon substrate of a MUMPs process chip. A piezoresistive layer of polysilicon embedded in sensor beams is used to detect the displacement of the suspended contacting pad. Each square tactile has dimensions of 200 /spl mu/m /spl times/ 200 /spl mu/m with 250 /spl mu/m center-to-center spacing. The entire sensor area is 1.25 mm /spl times/ 1.25 mm. The device was characterized under various normal force loads using weight microneedles. Individual sensor elements show linear response to normal force with good repeatability.

[1]  B. J. Kane,et al.  A traction stress sensor array for use in high-resolution robotic tactile imaging , 2000, Journal of Microelectromechanical Systems.

[2]  Lin Wang,et al.  Progress towards a smart skin: fabrication and preliminary testing , 1998, Proceedings of the 20th Annual International Conference of the IEEE Engineering in Medicine and Biology Society. Vol.20 Biomedical Engineering Towards the Year 2000 and Beyond (Cat. No.98CH36286).

[3]  Ronald S. Fearing,et al.  A surface micromachined microtactile sensor array , 1996, Proceedings of IEEE International Conference on Robotics and Automation.

[4]  Adisorn Tuantranont,et al.  Bulk-etched surface micromachined and flip-chip integrated micromirror array for infrared applications , 2000, 2000 IEEE/LEOS International Conference on Optical MEMS (Cat. No.00EX399).

[5]  V. Bright,et al.  Modeling of thermal actuation in a bulk-micromachined CMOS micromirror , 2000 .