Resilience of ultra-thin oxynitride films to percolative wear-out and reliability implications for high-κ stacks at low voltage stress
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Xing Wu | Nagarajan Raghavan | Michel Bosman | Kin Leong Pey | Andrea Padovani | Luca Larcher | L. Larcher | A. Padovani | Xing Wu | K. Pey | N. Raghavan | M. Bosman | Xiang Li | V. L. Lo | Xiang Li | V. Lo
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