论文信息 - Defect pattern Recognition in Semiconductor Fabrication using Model-based Clustering and Bayesian Inference - 字舞流文

Defect pattern Recognition in Semiconductor Fabrication using Model-based Clustering and Bayesian Inference

Suk Joo Bae | Seong-Joon Kim

[1] A. Raftery,et al. Model-based Gaussian and non-Gaussian clustering , 1993 .

[2] Fei-Long Chen,et al. A neural-network approach to recognize defect spatial pattern in semiconductor fabrication , 2000 .

[3] A. Raftery,et al. Detecting features in spatial point processes with clutter via model-based clustering , 1998 .

[4] Peter J. Diggle,et al. Statistical analysis of spatial point patterns , 1983 .

[5] A. Raftery,et al. Ice Floe Identification in Satellite Images Using Mathematical Morphology and Clustering about Principal Curves , 1992 .

[6] Jumi Kim. Optimization-Based Data Clustering Algorithm , 2007 .

[7] Zhaowei Zhong,et al. Defect detection on semiconductor wafer surfaces , 2005 .

[8] Vijayan N. Nair,et al. Monitoring wafer map data from integrated circuit fabrication processes for spatially clustered defects , 1997 .

[9] 김진욱,et al. 자동차부품 수주의사결정 모델에 관한 사례연구 , 2007 .

[10] Adrian E. Raftery,et al. Finding Curvilinear Features in Spatial Point Patterns: Principal Curve Clustering with Noise , 2000, IEEE Trans. Pattern Anal. Mach. Intell..

[11] Way Kuo,et al. Model-based clustering for integrated circuit yield enhancement , 2007, Eur. J. Oper. Res..

[12] G. Schwarz. Estimating the Dimension of a Model , 1978 .

[13] Kenneth W. Tobin,et al. Rapid yield learning through optical defect and electrical test analysis , 1998, Advanced Lithography.