Silicon-Layer Guided-Mode Resonance Polarizer With 40-nm Bandwidth

Fabrication and characterization of a guided-mode resonance-based polarizer is presented. This polarizer is made by electron-beam patterning a single layer of amorphous silicon on a glass substrate. The fabricated device has high and low transmittance for transverse-electric and transverse-magnetic polarizations, respectively, over a ~ 40-nm wavelength range for normally incident light. Its experimental extinction ratio is ~ 97:1 at a central wavelength of 1510 nm.

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