Process, design and optical proximity correction requirements for the 65nm device generation
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Vincent Wiaux | Geert Vandenberghe | Will Conley | Kevin Lucas | Sergei V. Postnikov | Christopher J. Progler | Olivier Toublan | Karl Wimmer | Bryan S. Kasprowicz | Lloyd C. Litt | Wei Wu | Bernard J. Roman | Patrick Montgomery | Chi-Min Yuan | Eric L. Fanucchi | Arjan Verhappen | Marc Olivares | Kirk Strozewski | Russell L. Carter | James Vasek | David Smith | Jan P. Kuijten | Johannes van Wingerden | Jeffrey W. Tracy | Eugene Shiro | Igor Topouzov