Sequential infiltration synthesis and pattern transfer using 6 nm half-pitch carbohydrate-based fingerprint block copolymer
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Ivan Maximov | Tommy Nylander | Alexei Vorobiev | Anette Löfstrand | Reza Jafari Jam | Muhammad Mumtaz | Karolina Mothander | Ahibur Rahaman | Wen-Chang Chen | Redouane Borsali | Wen‐Chang Chen | T. Nylander | I. Maximov | M. Mumtaz | R. Borsali | R. Jafari Jam | A. Löfstrand | A. Vorobiev | Karolina Mothander | Ahibur Rahaman
[1] Charles T. Black,et al. Plasma etch transfer of self-assembled polymer patterns , 2012, Advanced Lithography.
[2] I. Otsuka,et al. Carbohydrate-based block copolymer systems: directed self-assembly for nanolithography applications. , 2017, Soft matter.
[3] Nelson Felix,et al. Directed self-assembly of block copolymers for 7 nanometre FinFET technology and beyond , 2018, Nature Electronics.
[4] T. Satoh,et al. 10 nm Scale Cylinder-Cubic Phase Transition Induced by Caramelization in Sugar-Based Block Copolymers. , 2012, ACS macro letters.
[5] Collen Z. Leng,et al. Vapor phase infiltration (VPI) for transforming polymers into organic–inorganic hybrid materials: a critical review of current progress and future challenges , 2017 .
[6] Gabriella Andersson,et al. GenX: an extensible X-ray reflectivity refinement program utilizing differential evolution , 2007 .
[7] I. Manners,et al. Inorganic block copolymer lithography , 2013 .
[8] Y. Jung,et al. Fabrication of 50 nm scale Pt nanostructures by block copolymer (BCP) and its characteristics of surface-enhanced Raman scattering (SERS) , 2016 .
[9] J. Svensson,et al. Feature size control using surface reconstruction temperature in block copolymer lithography for InAs nanowire growth , 2020, Nanotechnology.
[10] S. Fort,et al. Control of 10 nm scale cylinder orientation in self-organized sugar-based block copolymer thin films. , 2013, Nanoscale.
[11] Torbjörn Eriksson,et al. High volume nanoimprint lithography on III/V substrates , 2011 .
[12] Hanqiong Hu,et al. Directed self-assembly of block copolymers: a tutorial review of strategies for enabling nanotechnology with soft matter. , 2014, Soft matter.
[13] P. Nealey,et al. Directed self-assembly of high-chi block copolymer for nano fabrication of bit patterned media via solvent annealing , 2016, Nanotechnology.
[14] T. Russell,et al. X-ray and neutron reflectivity for the investigation of polymers , 1990 .
[15] Bong Hoon Kim,et al. Directed self-assembly of block copolymers for next generation nanolithography , 2013 .
[16] Tandra Ghoshal,et al. Strategies for Inorganic Incorporation using Neat Block Copolymer Thin Films for Etch Mask Function and Nanotechnological Application , 2016, Advanced materials.
[17] G. Fredrickson,et al. Block copolymer thermodynamics: theory and experiment. , 1990, Annual review of physical chemistry.
[18] A Scherer,et al. Alumina etch masks for fabrication of high-aspect-ratio silicon micropillars and nanopillars , 2009, Nanotechnology.
[19] J. R. Granada,et al. Neutron Scattering Lengths and Cross Sections , 2013 .
[20] P. Nealey,et al. Directed self-assembly of block copolymers on chemical patterns: A platform for nanofabrication , 2016 .