论文信息 - Microstructure- and optic-related characteristics of magnesium oxide thin film

Microstructure- and optic-related characteristics of magnesium oxide thin film

Plasma display panel is one of the most potential flat devices for large-size displays. Magnesium oxide thin films have been used as a protective layer to improve discharge characteristics and the lifetime of panel. So magnesium oxide thin film is worthy to be studied. Magnesium oxide thin films were prepared by e-beam gun evaporation at a substrate temperature of 200°C. Heat annealing treatment and ion assisted deposition effect on thin films were investigated. The relation between these characteristics of films has been studied. The characteristics of the deposited films, including optical properties, crystalline structure, and microstructure were discussed.

[1] Jae-Jun Ko,et al. Measurement of Secondary Electron Emission Coefficient (γ) of MgO Protective Layer with Various Crystallinities , 1998 .

[2] J. McNeil,et al. Ion-assisted deposition of optical thin films: low energy vs high energy bombardment. , 1984, Applied optics.

[3] Dougal G. McCulloch,et al. The effect of annealing on the structure of cathodic arc deposited amorphous carbon nitride films , 1996 .

[4] Tianning Xu,et al. Annealing effects on the microstructure and photoluminescence properties of Ni-doped ZnO films , 2004 .

[5] H A Macleod,et al. Ion-beam-assisted deposition of thin films. , 1983, Applied optics.

[6] G. Berg,et al. Enhanced corrosion protection of magnesium oxide coatings on magnesium deposited by ion beam-assisted evaporation , 1998 .

[7] K. Amemiya,et al. High luminance efficiency and high definition Co-planner AC-PDP with "T"-shaped electrodes , 1998 .