论文信息 - Epitaxial ZnO Layer Growth on Si(111) Substrates with an Intermediate AlN Nucleation Layer by Methane-Based Chemical Vapor Deposition - 字舞流文

Epitaxial ZnO Layer Growth on Si(111) Substrates with an Intermediate AlN Nucleation Layer by Methane-Based Chemical Vapor Deposition

K. Thonke | U. Kaiser | Yueliang Li | U. Herr | A. Minkow | R. Müller | M. Madel | Florian Huber | Manuel Mundszinger | Jan-Patrick Scholz | Okan Gelme