Advanced photomask repair technology for 65-nm lithography: II

Yasutoshi Itou, Yoshiyuki Tanaka, Nobuyuki Yoshioka, *Yasuhiko Sugiyama, *Ryoji Hagiwara, *Haruo Takahashi, *Osamu Takaoka, *Tomokazu Kozakai, *Osamu Matsuda, *Katsumi Suzuki, *Mamoru Okabe, *Syuichi Kikuchi, *Atsushi Uemoto, *Anto Yasaka, *Tatsuya Adachi, **Naoki Nishida, **Toshiya Ozawa Semiconductor Leading Edge Technologies, Inc. 16-1, Onogawa, Tsukuba-shi, Ibaraki, 305-8569, Japan *SII NanoTechnorogy Inc. 36-1 Takenoshita, Oyama-cho, Sunto-gun, Shizuoka, 410-1393, Japan **HOYA Co. 1375 Kawaguchi-cho, Hachiouzi-si, Tokyo, 193-8525, Japan