Bulk micromachining characterization of 0.2 μm HEMT MMIC technology for GaAs MEMS design
暂无分享,去创建一个
Bernard Courtois | Renato P. Ribas | J. M. Karam | B. Courtois | P. Viktorovitch | J. Leclercq | R. Ribas | J. Karam | P Viktorovitch | J. L Leclercq
[1] K. Hjort. Sacrificial etching of III-V compounds for micromechanical devices : Sacrificial etching papers , 1996 .
[2] Bernard Courtois,et al. Collective fabrication of gallium-arsenide-based microsystems , 1996, Photonics West - Micro and Nano Fabricated Electromechanical and Optical Components.
[3] Hans L. Hartnagel,et al. Infrared thermopile sensor based on AlGaAs—GasAs micromachining , 1995 .
[4] Y. Uenishi,et al. Characterization of AlGaAs microstructure fabricated by AlGaAs/GaAs micromachining , 1994 .
[5] The piezoelectric effect of GaAs used for resonators and resonant sensors , 1994 .
[6] Jan Söderkvist,et al. Gallium arsenide as a mechanical material , 1994 .
[7] M. Dagenais,et al. Etch Characteristics of Succinic Acid/Ammonia/Hydrogen Peroxide versus Aluminum Mole Fraction in AlGaAs , 1993 .
[8] A. Abidi,et al. Large suspended inductors on silicon and their use in a 2- mu m CMOS RF amplifier , 1993, IEEE Electron Device Letters.
[9] T. Takebe,et al. Fundamental Selective Etching Characteristics of HF + H 2 O 2 + H 2 O Mixtures for GaAs , 1993 .
[10] G. Desalvo,et al. Etch Rates and Selectivities of Citric Acid/Hydrogen Peroxide on GaAs , Al0.3Ga0.7As , In0.2Ga0.8As , In0.53Ga0.47As , In0.52Al0.48As , and InP , 1992 .
[11] M.E. Goldfarb,et al. The effect of air bridge height on the propagation characteristics of microstrip , 1991, IEEE Microwave and Guided Wave Letters.
[12] Voitech Stankevic,et al. AlGaAs semiconductor pressure sensors , 1991 .
[13] D. Shaw,et al. Localized GaAs Etching with Acidic Hydrogen Peroxide Solutions , 1981 .
[14] Y. Mori,et al. A New Etching Solution System, H 3 PO 4 ‐ H 2 O 2 ‐ H 2 O , for GaAs and Its Kinetics , 1978 .
[15] D. Rode,et al. {332} Ga Habit Planes Formed on GaAs during Br2 : CH 3 OH Etching , 1975 .
[16] J. Gannon,et al. A Chemical Etchant for the Selective Removal of GaAs Through SiO2 Masks , 1974 .
[17] Kazuhiro Ito,et al. Selective Etching of Gallium Arsenide Crystals in H 2 SO 4 ‐ H 2 O 2 ‐ H 2 O System , 1971 .
[18] Yasoo Harada,et al. Preferential Etching and Etched Profile of GaAs , 1971 .