论文信息 - UV to IR laser damage of Magnetron Sputtering films submitted to multiple sub-picosecond pulses

UV to IR laser damage of Magnetron Sputtering films submitted to multiple sub-picosecond pulses

We report on the laser-induced damage threshold at 500fs of optical films made by Magnetron Sputtering and submitted to single and multiple irradiations at different harmonics of an Ytterbium laser (1030nm, 515nm and 343nm). Single layers of SiO2, HfO2, and Nb2O5 as bare fused silica samples are under investigation.

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