论文信息 - 650 nm lasers with narrow far-field divergence

650 nm lasers with narrow far-field divergence

We have reduced the measured vertical far-field divergence in a 650 nm strained SQW laser from 35/spl deg/ to 21/spl deg/ (FWHM), without changing the threshold current, operating voltage or thermal impedance, by introducing additional optical mode expansion layers.

P. Smowton | G. Berry | C. Button | H. Summers | P. Blood

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