论文信息 - EUV low-n attenuated phase-shift mask on random logic via single patterning at pitch 36nm - 字舞流文

EUV low-n attenuated phase-shift mask on random logic via single patterning at pitch 36nm

Jae Uk Lee | J. van de Kerkhove | V. Philipsen | R. Kim | Dongbo Xu | W. Gillijns | L. E. Tan