산화아연 박막전극을 이용한 전기화학발광셀의 제작 및 특성 고찰

Titanium-doped indium oxide (ITiO) films were prepared on soda-lime glass substrate using a magnetic null discharge (MND) sputter source. The ITiO thin films containing 10 wt.% Ti showed the minimum resistivity of p=5.5×10?³Ω-㎝. The optical transmittance increases from 70% at 450 ㎚ to 80% at 700 ㎚ in visible spectrum. Photoelectron peaks for In 3d, Ti 2p, O 1s and C1s were detected for the ITiO film in the binding energy range of 0 to 1100 eV. The surface roughness of the sample showed a change from 10 ㎚ to 50 ㎚. The ITiO film used for TCO layer of DSCs exhibited an energy conversion efficiency of about 3.8 % at light intensity of 100 ㎽/㎠.