论文信息 - Development of low-k precursors for next generation IC manufacturing - 字舞流文

Development of low-k precursors for next generation IC manufacturing

R. Opila | Dan Yang | C. Dussarrat | B. Wright | Curtis Anderson | J. Mcandrew | Francois Doniat

[1] Willi Volksen,et al. Low dielectric constant materials. , 2010, Chemical reviews.

[2] S. Gates,et al. Preparation and structure of porous dielectrics by plasma enhanced chemical vapor deposition , 2007 .