论文信息 - Ion beam lithography by using highly charged ion beam of Ar - 字舞流文

Ion beam lithography by using highly charged ion beam of Ar

S. A. Pahlovy | N. Morita | J. Taniguchi | Y. Nojiri | N. Kawasegi | I. Miyamoto | S. Momota | Mamoru Nagao | M. Kashihara | Shingo Iwamitsu | K. Nishimura | Takaaki Nakao