论文信息 - The multi-aperture hollow target: a method for determining ion incidence angles in plasma immersion ion implantation - 字舞流文

The multi-aperture hollow target: a method for determining ion incidence angles in plasma immersion ion implantation

K. Volz | W. Ensinger | H. Klein | C. Gabor | M. Galonska

[1] K. Volz,et al. Determination of ion incidence angles in plasma immersion ion implantation by means of a hollow multi-aperture target , 2001 .

[2] W. Ensinger. Research and development in plasma-based ion implantation in Europe. I. Apparatus and projects , 1999 .

[3] R. Thomae. Plasma-immersion ion implantation , 1998 .

[4] Jörg Brutscher,et al. A 100 kV 10 A high‐voltage pulse generator for plasma immersion ion implantation , 1996 .

[5] J. Schäfer,et al. Influence of plasma density and plasma sheath dynamics on the ion implantation by plasma immersion technique , 1996 .

[6] W. Ensinger,et al. Lateral implantation dose measurements of plasma immersion ion implanted non-planar samples , 1996 .

[7] J. Conrad. Plasma source ion implantation: A new approach to ion beam modification of materials , 1989 .

[8] J. Conrad. Sheath thickness and potential profiles of ion‐matrix sheaths for cylindrical and spherical electrodes , 1987 .