Characterization and optimization of a laser-produced x-ray source with a double-stream gas puff target
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Andrzej Bartnik | Henryk Fiedorowicz | Jacek Krzywinski | Roman Jarocki | Jerzy Kostecki | Rafal Rakowski | Miroslaw Szczurek
[1] Andrzej Bartnik,et al. Investigation of soft X-ray emission from a gas puff target irradiated with a Nd:YAG laser , 1999 .
[2] Tomas Mocek,et al. Investigation of soft x-ray emission in the water window for microscopy using a double-stream gas puff target irradiated with the Prague Asterix Laser System (PALS) , 2001, SPIE Optics + Photonics.
[3] Sebastian Kranzusch,et al. Laser-induced EUV source for optics characterization , 2001, SPIE Advanced Lithography.
[4] Andrzej Bartnik,et al. Characterization of a laser-produced x-ray source with a double-stream gas puff target for x-ray and EUV lithography , 2001, SPIE Advanced Lithography.
[5] Dennis L. Matthews,et al. Optimization of x‐ray sources for proximity lithography produced by a high average power Nd:glass laser , 1996 .
[6] Andrzej Bartnik,et al. Enhanced X-ray emission in the 1-keV range from a laser-irradiated gas puff target produced using the double-nozzle setup , 2000 .
[7] Andrzej Bartnik,et al. X-ray emission in the ‘water window’ from a nitrogen gas puff target irradiated with a nanosecond Nd:glass laser pulse , 1998 .
[8] Andrzej Bartnik,et al. Strong extreme ultraviolet emission from a double-stream xenon/helium gas puff target irradiated with a Nd:YAG laser , 2000 .
[9] Andrzej Bartnik,et al. X‐ray emission from laser‐irradiated gas puff targets , 1993 .