Instrumentation at Synchrotron Radiation Beamlines

Today there are a number of third-generation synchrotron facilities around the world, which are dedicated to the production of extremely intense radiation, ranging from infrared to hard X-rays. The wavelength tunability and the very high brightness of these sources have opened a wide range of new characterization procedures for research purposes. This paragraph is intended to describe various facets of both technological and analytical methods using synchrotron radiation, in order to help researchers and students who are interested in the study of materials. First, a concise introduction to synchrotron facilities and an overview of the main characteristics of the existing third-generation sources are presented. Then a basic line-up of beamlines for different energy ranges as well as the problems associated to beamline constructions and choices are described. Finally, for each energy range, a brief description of some techniques available in third-generation synchrotron facilities is given.

[1]  R. Frahm.  New method for time dependent x-ray absorption studies , 1989 .

[2]  Weilun Chao,et al.  Demonstration of 12 nm resolution Fresnel zone plate lens based soft x-ray microscopy. , 2009, Optics express.

[3]  Matthias Schroder,et al.  Theory Of X Ray Diffraction In Crystals , 2016 .

[4]  Hélio C. N. Tolentino,et al.  High‐resolution monochromator for soft and hard x rays , 1992 .

[5]  Anatoly Snigirev,et al.  High‐Resolution Transmission X‐ray Microscopy: A New Tool for Mesoscopic Materials , 2010, Advanced materials.

[6]  W. A. Dench,et al.  Quantitative electron spectroscopy of surfaces: A standard data base for electron inelastic mean free paths in solids , 1979 .

[7]  L. G. Parratt.  Surface Studies of Solids by Total Reflection of X-Rays , 1954 .

[8]  T. Ishikawa,et al.  Breaking the 10 nm barrier in hard-X-ray focusing , 2010 .

[9]  Jesse W. M. DuMond,et al.  Theory of the Use of More Than Two Successive X-Ray Crystal Reflections to Obtain Increased Resolving Power , 1937 .

[10]  Andreas K. Freund,et al.  The present state of Kirkpatrick-Baez mirror systems at the ESRF , 2002, SPIE Optics + Photonics.

[11]  Eugene L. Church,et al.  Specification of glancing- and normal-incidence x-ray mirrors [also Erratum 34(11)3348(Nov1995)] , 1995 .

[12]  Jörg Maser,et al.  Two dimensional hard x-ray nanofocusing with crossed multilayer Laue lenses. , 2011, Optics express.

[13]  Cooper,et al.  New approach to the study of nuclear Bragg scattering of synchrotron radiation. , 1987, Physical review letters.

[14]  T. Warwick,et al.  Principles and Applications of Zone Plate X-Ray Microscopes , 2007 .

[15]  W. Yun,et al.  30 nm resolution x-ray imaging at 8 keV using third order diffraction of a zone plate lens objective in a transmission microscope , 2006 .

[16]  Giorgio Margaritondo,et al.  Hard-X-ray Zone Plates: Recent Progress , 2012, Materials.

[17]  Q. Shen,et al.  Takagi-taupin description of x-ray dynamical diffraction from diffractive optics with large numerical aperture. , 2007, 0704.3982.

[18]  P. Kirkpatrick,et al.  Formation of optical images by X-rays. , 1948, Journal of the Optical Society of America.

[19]  H. Padmore,et al.  Performance of the vacuum ultraviolet high-resolution and high-flux beamline for chemical dynamics studies at the Advanced Light Source , 1997 .

[20]  H. Takano,et al.  Circular multilayer zone plate for high-energy x-ray nano-imaging. , 2012, The Review of scientific instruments.

[21]  Jörg Raabe,et al.  Advanced thin film technology for ultrahigh resolution X-ray microscopy. , 2009, Ultramicroscopy.

[22]  W. Stickle,et al.  Handbook of X-Ray Photoelectron Spectroscopy , 1992 .

[23]  P. Thibault,et al.  Transmission and emission x-ray microscopy: operation modes, contrast mechanisms and applications , 2011, Journal of physics. Condensed matter : an Institute of Physics journal.

[24]  W. Zachariasen,et al.  Theory of X-Ray Diffraction in Crystals , 1968 .

[25]  S. Narayanan,et al.  Initial Characterization and Design of an UHV‐Compatible Artificial Channel‐Cut Monochromator , 2007 .

[26]  J. Berkowitz,et al.  Photoionization mass spectrometry of neon using synchrotron radiation: Anomalous variation of resonance widths in the noble gases , 1979 .

[27]  S. Hüfner,et al.  Photoemission spectroscopy—from early days to recent applications , 2005 .

[28]  Irina Snigireva,et al.  Nanofocusing parabolic refractive x-ray lenses , 2003 .

[29]  H. Rowland.  XXIX. On concave gratings for optical purposes , 1883 .

[30]  A. Fujimori,et al.  Unmasking the Nodal Quasiparticle Dynamics in Cuprate Superconductors Using Low-Energy Photoemission , 2006, cond-mat/0603006.

[31]  P. L. Cowan,et al.  X‐ray monochromator system for use with synchrotron radiation sources , 1981 .

[32]  M. C. Hutley,et al.  The use of apodization to reduce stray light from diffraction gratings , 1982 .

[33]  W. Jark.  Soft x‐ray monochromator configurations for the ELETTRA undulators: A stigmatic SX700 (invited) , 1992 .

[34]  Christian Morawe,et al.  Multilayer growth in the APS rotary deposition system , 2007, SPIE Optical Engineering + Applications.

[35]  J. Itié,et al.  ODE: a new beam line for high-pressure XAS and XMCD studies at SOLEIL , 2011 .

[36]  Anatoly Snigirev,et al.  Nanotomography based on hard x-ray microscopy with refractive lenses , 2002 .

[37]  H. C. Kang,et al.  Nanometer linear focusing of hard x rays by a multilayer Laue lens. , 2006, Physical review letters.

[38]  S. Belin,et al.  The SAMBA quick-EXAFS monochromator: XAS with edge jumping. , 2012, Journal of synchrotron radiation.

[39]  Elina Färm,et al.  Dense high aspect ratio hydrogen silsesquioxane nanostructures by 100 keV electron beam lithography , 2010, Nanotechnology.

[40]  Andrea Di Cicco,et al.  Novel XAFS capabilities at ELETTRA synchrotron light source , 2009 .

[41]  W. Peatman,et al.  Review of plane grating focusing for soft x‐ray monochromators , 1995 .

[42]  A. Macrander,et al.  Depth-graded multilayers for application in transmission geometry as linear zone plates , 2005 .

[43]  Roger W. Falcone,et al.  New directions in X-ray microscopy , 2011 .

[44]  Jörg Maser,et al.  Focusing of hard x-rays to 16 nanometers with a multilayer Laue lens , 2008 .

[45]  A. Sakdinawat,et al.  Nanoscale X-ray imaging , 2009 .

[46]  M. Burghammer,et al.  Hard x-ray nanoprobe based on refractive x-ray lenses , 2005 .

[47]  E. H. Linfoot.  Principles of Optics , 1961 .

[48]  S. Diaz-Moreno.  XAFS data collection: an integrated approach to delivering good data. , 2012, Journal of synchrotron radiation.

[49]  H. Haber,et al.  The Torus Grating , 1950 .

[50]  Hanfei Yan,et al.  Optimization of multilayer Laue lenses for a scanning X-ray microscope. , 2013, Journal of synchrotron radiation.

[51]  Eric Ziegler,et al.  Design and performance of graded multilayers as focusing elements for x-ray optics , 1999 .

[52]  S. Kikuta,et al.  Use of Asymmetric Dynamical Diffraction of X-rays for Multiple-Crystal Arrangements of the (n1, +n2)Setting , 1973 .

[53]  Hidekazu Mimura,et al.  Development of scanning x-ray fluorescence microscope with spatial resolution of 30 nm using Kirkpatrick-Baez mirror optics , 2006 .

[54]  B. Lengeler,et al.  A compound refractive lens for focusing high-energy X-rays , 1996, Nature.

[55]  Francesco Sette,et al.  Performance of the Dragon soft x‐ray beamline (invited) , 1989 .

[56]  M. Martins,et al.  A 10 m-normal incidence monochromator at the quasi-periodic undulator U125-2 at BESSY II , 2001 .