论文信息 - Comparison of the Material Quality of AlxIn1−xN (x—0–0.50) Films Deposited on Si(100) and Si(111) at Low Temperature by Reactive RF Sputtering - 字舞流文

Comparison of the Material Quality of AlxIn1−xN (x—0–0.50) Films Deposited on Si(100) and Si(111) at Low Temperature by Reactive RF Sputtering

E. Monroy | F. Naranjo | S. Molina | S. Valdueza-Felip | M. de la Mata | A. Ajay | Michael Sun | R. Blasco | J. Nwodo