论文信息 - Alternative approaches for high-k/metal gate CMOS: Low temperature process (gate last) and SiGe channel - 字舞流文

Alternative approaches for high-k/metal gate CMOS: Low temperature process (gate last) and SiGe channel

P. Kirsch | K. Tateiwa | R. Jammy | C. Park | J. Huang | S. Lian | M. Hussain | J. Lin | K. Rader | B. Taylor | T. Ngai