Simulation of GaN-Based Light-Emitting Diodes With Hemisphere Patterned Sapphire Substrate Based on Poynting Vector Analysis

The GaN-based light-emitting diodes (LEDs) with hemisphere patterned sapphire substrate (PSS) have been investigated numerically using a combined method of ray tracing and finite-difference time-domain techniques based on Poynting vector. Our method has been verified using unpatterned sapphire substrate for which analytical formulas exist. The simulated results show that the hemisphere PSS can improve the light extraction efficiency by increasing the reflection angle, decreasing the transmission angle, enhancing the reflectance of light incident on it, and enlarging the escape cone at its interface. Moreover, it is found that the hemisphere pattern size has significant influence on the improvement of the LED emission efficiency. The optimal radius of the hemisphere is about the emission wavelength of GaN-based LEDs, which can be attributed to the strong effect of wave properties of light at the PSS interface.

[1]  Kai-Feng Huang,et al.  Improved Output Power of Nitride-Based Light-Emitting Diodes With Convex-Patterned Sapphire Substrates , 2012, IEEE Photonics Technology Letters.

[2]  Yan-Kuin Su,et al.  Pattern-size dependence of characteristics of nitride-based LEDs grown on patterned sapphire substrates , 2009 .

[3]  황보창권 THIN-FILM OPTICAL FILTERS(Third Edition, IoP, 2001)-H. Angus Macleod , 2007 .

[4]  Yang Sheng,et al.  Simulation of InGaN/GaN light-emitting diodes with patterned sapphire substrate , 2012 .

[5]  Masahiro Kimura,et al.  High‐efficiency UV LEDs and RGB white LEDs for lighting and LCD backlights , 2011 .

[6]  Hui Yang,et al.  Effect of Patterned Sapphire Substrate Shape on Light Output Power of GaN-Based LEDs , 2011, IEEE Photonics Technology Letters.

[7]  Takashi Mukai,et al.  InGaN-Based Near-Ultraviolet and Blue-Light-Emitting Diodes with High External Quantum Efficiency Using a Patterned Sapphire Substrate and a Mesh Electrode , 2002 .

[8]  Y. S. Wu,et al.  Enhanced performance of an InGaN-GaN light-emitting diode by roughening the undoped-GaN surface and applying a mirror coating to the sapphire substrate , 2006 .

[9]  Zhizhong Chen,et al.  Analyses of light extraction efficiency in GaN-based LEDs grown on patterned sapphire substrates , 2012 .

[10]  H. Macleod,et al.  Thin-Film Optical Filters , 1969 .

[11]  James S. Speck,et al.  Prospects for LED lighting , 2009 .

[12]  Solomon W. S. Chi,et al.  Effects of Lens Shape on GaN Grown on Microlens Patterned Sapphire Substrates by Metallorganic Chemical Vapor Deposition , 2010 .

[13]  Ray-Hua Horng,et al.  Fabrication of Pyramidal Patterned Sapphire Substrates for High-Efficiency InGaN-Based Light Emitting Diodes , 2006 .

[15]  Hadis Morkoç,et al.  Valence‐band discontinuities of wurtzite GaN, AlN, and InN heterojunctions measured by x‐ray photoemission spectroscopy , 1996 .

[16]  Z. Q. Li,et al.  Simulation of InGaN/GaN multiple quantum well light-emitting diodes with quantum dot model for electrical and optical effects , 2006, 2006 International Conference on Numerical Simulation of Semiconductor Optoelectronic Devices.

[17]  Allen Taflove,et al.  Computational Electrodynamics the Finite-Difference Time-Domain Method , 1995 .

[18]  Hui Yang,et al.  Pattern Design of and Epitaxial Growth on Patterned Sapphire Substrates for Highly Efficient GaN-Based LEDs , 2012 .

[19]  Tsunemasa Taguchi,et al.  High Output Power InGaN Ultraviolet Light-Emitting Diodes Fabricated on Patterned Substrates Using Metalorganic Vapor Phase Epitaxy , 2001 .

[20]  Dong-Yul Lee,et al.  Comparison of InGaN-Based LEDs Grown on Conventional Sapphire and Cone-Shape-Patterned Sapphire Substrate , 2010, IEEE Transactions on Electron Devices.

[21]  Jung-Hee Lee,et al.  Stress Reduction and Enhanced Extraction Efficiency of GaN-Based LED Grown on Cone-Shape-Patterned Sapphire , 2008, IEEE Photonics Technology Letters.

[22]  Yiping Zeng,et al.  Improvement of the performance of GaN-based LEDs grown on sapphire substrates patterned by wet and ICP etching , 2008 .