Ultrathin SiOxNy by rapid thermal heating of silicon in N2 at T=760–1050 °C
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E. P. Gusev | Leonard C. Feldman | Martin L. Green | Eric Garfunkel | T. W. Sorsch | L. Feldman | T. Sorsch | E. Gusev | E. Garfunkel | H. C. Lu | T. Gustafsson | H. C. Lu | Torgny Gustafsson | W. N. Lennard | W. Lennard
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