X-ray lens with kinoform refractive profile created by x-ray lithography

X-ray kinoform lenses were proposed earlier as focusing devices with refractive and diffractive properties. Deep X-ray lithography technique was applied to realize kinoform lenses in thick resist layers PMMA. Created lens has rather short focal distance 20 cm at base energy 17.5 keV and full aperture 1.5mm with outermost segments 2 μm in width. Predicted performance of created lens is compared with simple parabolic lenses. Applications of kinoform lenses are considered and potentials of X-ray lithography for creation new versions of refractive focusing devices are discussed.