Chemical characterization of SiCxNy nanolayers by FTIR-and Raman spectroscopy, XPS and TXRF-NEXAFS
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B. Beckhoff | A. Klein | W. Ensinger | G. Ulm | M. Kosinova | N. Fainer | Y. Rumyantsev | V. Trunova | O. Baake | P. Hoffmann | B. Pollakowski