Dimensional Micro- and Nanometrology at PTB

In this contribution we will provide an overview of the current state and the actually ongoing developments in the field of dimensional micro- and nanometrology at PTB. That is, we will report on the methods and instruments developed, applied and that are in development for high precision, traceable measurements in these important areas of dimensional metrology. The control of the geometrical dimensions in the industrial production of single components and whole systems demands appropriate measurement techniques. The related measurement instruments have to be chosen according to different criteria like throughput, robustness, price, 3D-capability, in-line ability, measurement range, required resolution and accuracy. Meanwhile, dimensional features in the area of micro- and microsystem technology can be characterized and controlled during production on the basis of traceable measurement results in the same way as in conventional manufacturing process control. In nanotechnology the desired properties of the product often depend much stronger on the geometrical dimensions or even appear as a consequence of the reduced dimensions and therefore even tighter specifications have to be met. Here the progress made in the available measurement equipment over the last two decades has just enabled this field of technology. Dimensional metrology instruments aiming at the smallest measurement uncertainties achievable have to comply with two fundamental requirements. Firstly a well-designed and well-characterized positioning system, which provides a relative movement of the measurement object with its functional dimensional features of interest with respect to the probing system of the measurement instrument, is mandatory. Secondly, a sound physical model of the interaction of the probing system with the dimensional features of the sample should be available and applied in the evaluation of the measurement results. This is particularly important if the size of the features comes close to the resolution limit of the probing system. The measurement of some geometrical properties, for example the diameter of nanoparticles, is simply impossible without considering the probe sample interaction. We will show examples of different probing methods in this paper, namely tactile, opto- tactile, optical and electron beam methods and discuss challenges for future developments in micro- and nanometrology.

[1]  Ludger Koenders,et al.  An ultra-precision interference comparator for dimensional measurements using two tunnelling microscopes as probes , 2003 .

[2]  Phj Piet Schellekens,et al.  Design of a 3D CMM with elastically guided z-axis and x,y axis with less than 2 mm ABBE offset , 2002 .

[3]  Markus Bartscher,et al.  Enhancement and Proof of Accuracy of Industrial Computed Tomography (CT) Measurements , 2007 .

[4]  Thorsten Dziomba,et al.  A landmark-based 3D calibration strategy for SPM , 2007 .

[5]  Bernd Bodermann,et al.  A new flexible scatterometer for critical dimension metrology. , 2010, The Review of scientific instruments.

[6]  Gaoliang Dai,et al.  A high precision micro/nano CMM using piezoresistive tactile probes , 2009 .

[7]  C. G. Frase,et al.  Use of Monte Carlo models in the development and validation of CD operators , 2005 .

[8]  A. Schlachetzki,et al.  Systematic investigations of nanostructuring by scanning tunneling microscopy , 1996 .

[9]  Uwe Brand,et al.  A new facility to realize a nanonewton force standard based on electrostatic methods , 2009 .

[10]  Ludger Koenders,et al.  Aspects of scanning force microscope probes and their effects on dimensional measurement , 2008 .

[11]  Bernd Bodermann,et al.  Comparison of different approaches for modelling microscope images on the basis of rigorous diffraction calculation , 2005, SPIE Optical Metrology.

[12]  Ralf D. Geckeler Optimal use of pentaprisms in highly accurate deflectometric scanning , 2007 .

[13]  A. Rathsfeld,et al.  Mathematical modelling of indirect measurements in scatterometry , 2006 .

[14]  Uwe Brand,et al.  Modelling and investigation of the mechanical and electrical characteristics of the silicon 3D-boss microprobe for force and deflection measurements , 2006 .

[15]  Rainer Köning,et al.  Achievement of sub nanometer reproducibility in line scale measurements with the nanometer comparator , 2007, SPIE Advanced Lithography.

[16]  Helmut Wolff,et al.  Design and three dimensional calibration of a measuring scanning tunneling microscope for metrological applications , 1994 .

[17]  Ludger Koenders,et al.  A combined scanning tunnelling microscope and x-ray interferometer , 2001 .

[18]  V. Nesterov,et al.  Facility and methods for the measurement of micro and nano forces in the range below 10?5 N with a resolution of 10?12 N (development concept) , 2007 .

[19]  Jens Flugge,et al.  Recent activities at PTB nanometer comparator , 2003, SPIE Optics + Photonics.

[20]  Ludger Koenders,et al.  An atomic force microscope for the study of the effects of tip–sample interactions on dimensional metrology , 2007 .

[21]  Uwe Brand,et al.  A micro-CMM with metrology frame for low uncertainty measurements , 2005 .

[22]  Egbert Buhr,et al.  Report on an international comparison of one-dimensional (1D) grating pitch , 2009 .

[23]  Harald Bosse,et al.  Characterization of nanoparticles by scanning electron microscopy in transmission mode , 2009 .

[24]  Kevin M. Shakesheff,et al.  Blind reconstruction of scanning probe image data , 1996 .

[25]  Kai Dirscherl,et al.  NANO5—2D Grating—Final report , 2008 .

[26]  Ludger Koenders,et al.  From nanometre to millimetre: a feasibility study of the combination of scanning probe microscopy and combined optical and x-ray interferometry , 2003 .

[27]  Masayuki Abe,et al.  Chemical identification of individual surface atoms by atomic force microscopy , 2007, Nature.

[28]  Andreas Just,et al.  Calibration of high-resolution electronic autocollimators against an angle comparator , 2003 .

[29]  Peter Thomsen-Schmidt Characterization of a traceable profiler instrument for areal roughness measurement , 2011 .

[30]  Gaoliang Dai,et al.  Nanoscale surface measurements at sidewalls of nano- and micro-structures , 2007 .

[31]  Gaoliang Dai,et al.  Metrological large range scanning probe microscope , 2004 .

[32]  A. Abou‐Zeid,et al.  PTB's Precision Interferometer for High Accuracy Characterization of Thermal Expansion Properties of Low Expansion Materials , 2006 .

[33]  Heinrich Schwenke,et al.  Opto-tactile Sensor for 2D and 3D Measurement of Small Structures on Coordinate Measuring Machines , 2001 .

[34]  R. Thalmann,et al.  Ultraprecision micro-CMM using a low force 3D touch probe , 2007 .

[35]  Hans-Ulrich Danzebrink,et al.  Compact field programmable gate array (FPGA)-based multi-axial interferometer for simultaneous tilt and distance measurement in the sub-nanometre range , 2011 .

[36]  Harald Bosse,et al.  Calibration of CD mask standards for the 65-nm node: CoG and MoSi , 2007, European Mask and Lithography Conference.

[37]  J. Villarrubia Algorithms for Scanned Probe Microscope Image Simulation, Surface Reconstruction, and Tip Estimation , 1997, Journal of research of the National Institute of Standards and Technology.

[38]  Bernd Bodermann,et al.  A new high-aperture 193 nm microscope for the traceable dimensional characterization of micro- and nanostructures , 2009 .