Projection Mask-Less Lithography (PML2) is a potentially cost-effective electron multi-beam solution for the 22nm hp technology node and beyond. PML2 is targeted on using hundreds of thousands of individually addressable electron-beams working in parallel, thereby pushing the potential throughput into the wafers per hour regime. With resolution potential beyond 10nm PML2 is designed to meet the requirements of several upcoming IC generations. First results obtained with a PML2 proof-of-concept test system are presented. This test system is equipped with an Aperture Plate system (APS) providing 2500 programmable [email protected] beams which are projected onto wafer level with 200x demagnification. The APS contains CMOS electronics which allows for addressable deflection of selected beams; only non-deflected beams make it to the wafer surface to achieve 12.5nm spot size. Beam energy (50keV) and current density (~2A/cm^2) are the same as in future PML2 production tools. The results obtained with the proof-of-concept test system prove the patterning capabilities of the PML2 technology.