论文信息 - Influence of the pellicle on final photomask flatness

Influence of the pellicle on final photomask flatness

Photomask pellicles play an important role in determining final photomask flatness, which is important to photomask optical performance. This study explores the impact of the pellicle frame flatness and pellicle-to-mask adhesive on photomask flatness. In addition, the change in mask flatness as a function of time after pellicle mounting is studied. Implications of these results on photomask manufacture and photolithography are discussed.

Richard Wistrom | Kenneth C. Racette | Andrew J. Watts | Monica Barrett | Dennis M. Hayden

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