论文信息 - Characterization of Defects Created in Silicon Due to Etching in Low-Pressure Plasmas Containing Fluorine and Oxygen - 字舞流文

Characterization of Defects Created in Silicon Due to Etching in Low-Pressure Plasmas Containing Fluorine and Oxygen

A. Henry | I. Buyanova | B. Monemar | B. Svensson | G. Oehrlein | J. Lindstroem | A. Lamprecht