Finite-element analysis of semiconductor devices: the FIELDAY program

The FIELDAY program simulates semiconductor devices of arbitrary shape in one, two, or three dimensions operating under transient or steady-state conditions. A wide variety of physical effects, important in bipolar and field-effect transistors, can be modeled. The finite-element method transforms the continuum description of mobile carrier transport in a semiconductor device to a simulation model at a discrete number of points. Coupled and decoupled algorithms offer two methods of linearizing the differential equations. Direct techniques are used to solve the resulting matrix equations. Pre- and post-processors enable users to rapidly generate new models and analyze results. Specific examples illustrate the flexibility and accuracy of FIELDAY.

[1]  R. A. Larsen A Silicon and Aluminum Dynamic Memory Technology , 1980, IBM J. Res. Dev..

[2]  R. E. Thomas,et al.  Carrier mobilities in silicon empirically related to doping and field , 1967 .

[3]  G. W. Brown,et al.  The numerical solution of poisson's equation for two-dimensional semiconductor devices , 1976 .

[4]  H. Gummel A self-consistent iterative scheme for one-dimensional steady state transistor calculations , 1964 .

[5]  W. Read,et al.  Statistics of the Recombinations of Holes and Electrons , 1952 .

[6]  J. Dziewior,et al.  Auger coefficients for highly doped and highly excited silicon , 1977 .

[7]  R. R. O'Brien,et al.  Computer aided two-dimensional analysis of the junction field-effect transistor , 1970 .

[8]  R. Hall Electron-Hole Recombination in Germanium , 1952 .

[9]  R. R. O'Brien,et al.  Semiconductor analysis using finite elements: part II: IGFET and BJT case studies , 1981 .

[10]  T. Watson,et al.  Geometry effects of small MOSFET devices , 1979, 1977 International Electron Devices Meeting.

[11]  J. Borel,et al.  An accurate two-dimensional numerical analysis of the MOS transistor , 1972 .

[12]  P. Cottrell,et al.  TA-A6 threshold and subthreshold characteristics of VMOS FET via a two-dimensional finite element model , 1978, IEEE Transactions on Electron Devices.

[13]  S. Asai,et al.  Two-dimensional numerical analysis of stability criteria of GaAs FET's , 1976, IEEE Transactions on Electron Devices.

[14]  C. R. Crowell,et al.  Temperature dependence of avalanche multiplication in semiconductors , 1966 .

[15]  T. Sudo,et al.  Two-dimensional semiconductor analysis using finite-element method , 1979, IEEE Transactions on Electron Devices.

[16]  J. Barnes,et al.  The buried-source VMOS dynamic RAM device , 1977, 1977 International Electron Devices Meeting.

[17]  A. Wexler,et al.  Numerical analysis of semiconductor devices: Edited by B. T. Browne and J. J. H. Miller Boole Press, Dublin, 1979, 303 pp. $42.00 , 1981 .

[18]  H. H. Heimeier A two-dimensional numerical analysis of a silicon N-P-N transistor , 1973 .

[19]  Raya Mertens,et al.  Transport equations in heavy doped silicon , 1973 .

[20]  M. Reiser,et al.  A two-dimensional numerical FET model for DC, AC, and large-signal analysis , 1973 .

[21]  E. M. Buturla,et al.  Steady-state analysis of field effect transistors via the finite element method , 1975 .

[22]  P.E. Cottrell,et al.  Narrow channel effects in insulated gate field effect transistors , 1976, 1976 International Electron Devices Meeting.

[23]  R. R. O'Brien,et al.  Semiconductor analysis using finite elements: part I: computational aspects , 1981 .

[24]  F. D. L. Moneda Threshold voltage from numerical solution of the two-dimensional MOS transistor , 1973 .

[25]  H. C. de Graaff,et al.  Measurements of bandgap narrowing in Si bipolar transistors , 1976 .

[26]  H. Kotecha,et al.  Interaction of IGFET field design with narrow channel device operation , 1980, 1980 International Electron Devices Meeting.

[27]  R. Lomax,et al.  Finite-element methods in semiconductor device simulation , 1977, IEEE Transactions on Electron Devices.

[28]  Savvas G. Chamberlain,et al.  Computer model and charge transport studies in short gate charge-coupled devices , 1977 .

[29]  J. Slotboom,et al.  Computer-aided two-dimensional analysis of bipolar transistors , 1973 .

[30]  C. R. Crowell,et al.  Current transport in metal-semiconductor barriers , 1966 .

[31]  E. M. Buturla,et al.  Simulation of semiconductor transport using coupled and decoupled solution techniques , 1980 .

[32]  R. Losehand,et al.  VMOS technology applied to dynamic RAMs , 1978 .

[33]  W. V. Roosbroeck Theory of the flow of electrons and holes in germanium and other semiconductors , 1950 .

[34]  J. Archer Consistent matrix formulations for structural analysis using influence-coefficient techniques , 1964 .

[35]  S. P. Gaur,et al.  Two-dimensional carrier flow in a transistor structure under non-isothermal conditions , 1974 .

[36]  Andres G. Fortino,et al.  A simply implemented two dimensional Shockley–Poisson solver with applications to CCD , 1979 .