论文信息 - Vibrational properties of SiO and SiH in amorphous SiOx:H films (0 ≤ x ≤ 2.0) prepared by plasma-enhanced chemical vapor deposition☆ - 字舞流文

Vibrational properties of SiO and SiH in amorphous SiOx:H films (0 ≤ x ≤ 2.0) prepared by plasma-enhanced chemical vapor deposition☆

T. Inokuma | S. Hasegawa | Y. Kurata | L. He

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