Novel planar electroabsorption waveguide modulator for rf applications
暂无分享,去创建一个
Paul K. L. Yu | Richard Joseph Orazi | Robert B. Welstand | Q. Z. Liu | S. A. Pappert | R. J. Orazi | S. S. Lau | P. Yu | S. Lau | S. Pappert | R. Welstand | Qizhi Z. Liu
[1] Paul Anthony Kirkby,et al. Photoelastic waveguides and their effect on stripe‐geometry GaAs/Ga1−xAlxAs lasers , 1979 .
[2] P. Yu,et al. A novel processing technique to fabricate planar InGaAsP/InP electroabsorption waveguide modulators , 1995 .
[3] T. Benson,et al. A novel electro-optically controlled directional-coupler switch in GaAs epitaxial layers at 1.15 µm , 1982, IEEE Transactions on Electron Devices.
[4] A. L. Kellner,et al. Enhanced linear dynamic range property of Franz-Keldysh effect waveguide modulator , 1995, IEEE Photonics Technology Letters.
[5] N. Linder,et al. Polarization-insensitive high-contrast GaAs/AlGaAs waveguide modulator based on the Franz-Keldysh effect , 1993, IEEE Photonics Technology Letters.
[6] P. Yu,et al. Photoelastic waveguides and the controlled introduction of strain in III‐V semiconductors by means of thin film technology , 1995 .
[7] Paul K. L. Yu,et al. Design and fabrication of InGaAsP/InP waveguide modulators for microwave applications , 1992, Defense, Security, and Sensing.
[8] P. N. Robson,et al. Strain-induced optical waveguiding in GaAs epitaxial layers at 1.15 μm , 1979 .