Nanoimprint lithography (NIL) has the advantage of high-throughput, sub-10 nm resolution and low cost [1]. It has been included into 2003 ITRS as the Next Generation Lithography (NGL) for 45 nm node [2]. This paper summarized current status of Nanonex imprint technologies. Nanonex imprint process includes thermal nanoimprint (T-NIL) and photo-curable nanoimprint (P-NIL). Both T-NIL and P-NIL utilized a proprietary air cushion press (ACP), which has the advantage of ultra-uniformity, low lateral stress, less damage to the mold and substrate, and higher alignment accuracy. Nanonex Corporation delivers user-friendly nanoimprint lithography tools and solutions for both experts and non-experts of micro and nanofabrication. Nanoimprint machines, resists, molds and processes have been developed and are available today.