Synthesis and Characterization of Carbon Nitride Films for Micro Humidity Sensors

Nano-structured carbon nitride (CNx) films were synthesized by a reactive RF magnetron sputtering system with a DC bias under various deposition conditions, and their physical and electrical properties were investigated with a view to using them for micro humidity sensors. The FTIR spectra of the deposited films showed a C=N stretching band in the range of 1600∼1700 cm-1, depending on the amount of nitrogen incorporation. The carbon nitride films deposited on the Si substrate had a nano-structured surface morphology with a grain size of about 20 nm, and their deposition rate was 1.5 μm/hr. The synthesized films had a high electrical resistivity in the range of 108 to 109 Ω·cm, depending on the deposition conditions. The micro humidity sensors showed a good linearity and low hysteresis between 5 ∼ 95 %RH.

[1]  Bernard J. Feldman,et al.  Structural and optical properties of amorphous carbon nitride , 1988 .

[2]  J. Pou,et al.  Carbon nitride films prepared by excimer laser ablation , 1997 .

[3]  M. Jelínek,et al.  Correlation between photoluminescence, optical and structural properties of amorphous nitrogen-rich carbon nitride films , 2001 .

[4]  S. P. Lee,et al.  Effect of hydrogen on carbon nitride film deposition , 2001 .

[5]  M. Sun,et al.  The investigation of carbon nitride films annealed at different temperatures , 2003 .

[6]  S. J. Gregg,et al.  Adsorption Surface Area and Porosity , 1967 .

[7]  C. Singh Bhatia,et al.  Tribological Behavior of Amorphous Carbon Nitride Overcoats for Magnetic Thin-Film Rigid Disks , 1995 .

[8]  Michael Sung,et al.  Carbon nitride and other speculative superhard materials , 1996 .

[9]  Jianjun Wang,et al.  Photoluminescent carbon nitride films grown by vapor transport of carbon nitride powders. , 2002, Chemical communications.

[10]  A. Liu,et al.  Prediction of New Low Compressibility Solids , 1989, Science.

[11]  J. Lee,et al.  Characterization of Crystalline Carbon Nitride Films Deposited on Si and Si3N4/Si Substrate by RF Magnetron Sputtering System with DC Bias , 2004 .

[12]  Wu,et al.  Observation of crystalline C3N4. , 1994, Physical review. B, Condensed matter.

[13]  I. Rangelow,et al.  Gas‐Sensitive Properties of Nitrogen‐Rich Carbon Nitride Films , 2000 .

[14]  M. Monclús,et al.  Electrical properties of reactively sputtered carbon nitride films , 1999 .

[15]  John Robertson,et al.  Ultrathin carbon coatings for magnetic storage technology , 2001 .

[16]  F. C. Marques,et al.  Structural changes in amorphous carbon nitride films due to bias voltage , 2006 .

[17]  E. Broitman,et al.  CARBON NITRIDE NANOTUBULITE - DENSELY-PACKED AND WELL-ALIGNED TUBULAR NANOSTRUCTURES , 1999 .