Work function engineering by FUSI and its impact on the performance and reliability of oxynitride and Hf-silicate based MOSFETs
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K. Devriendt | A. Veloso | M. Jurczak | A. Lauwers | L. Witters | S. Kubicek | T. Kauerauf | S. Brus | S. Biesemans | K. Anil | J. de Marneffe | B. Sijmus