Micropattern Formation by Molecular Migration via UV‐induced Dehydration of Block Copolymers
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K. Okada | Yasuaki Tokudome | H. Ogawa | P. Falcaro | K. Konstas | L. Malfatti | P. Innocenzi | Masahide Takahashi | T. Kanaya | R. Makiura | Y. Tokudome